Spin coating is an efficient method for creating thin, uniform coatings on substrates, commonly used in semiconductor fabrication, nanotechnology, and materials science. A small volume of liquid material is placed at the center of the substrate, which is then spun quickly. The centrifugal force distributes the liquid evenly, resulting in a thin, homogeneous film. The thickness of the film is regulated by the spin speed and the viscosity of the liquid. Spin coating plays an important role in producing coatings for electronics, solar cells, optical components, and photolithography.